Schlumberger

FMI-HD High-Definition Formation Microimager

Detailed, high-quality images in water-base mud environments that cannot be clearly imaged with conventional microresistivity imaging technology

The FMI-HD high-definition formation microimager takes high definition to a new level of clarity. The visibility and interpretability of small features is significantly increased for all environmental conditions—even across extreme variations in formation resistivity or resistivity anisotropy between the formation and mud (Rt/Rm). This means that water-base mud (WBM) environments that cannot be clearly imaged with conventional microresistivity imaging technology can now be seen in great detail, including wells drilled with salt-saturated muds or high-resistivity reservoirs.

Enhanced technology for 4× increase in image definition

The FMI-HD high-definition formation microimager builds on the well-proven microresistivity imaging design of the industry-standard FMI fullbore formation microimager. Completely new electronics provide a step-improvement in operating range, reliability, and image quality. Enhanced parallel signal processing and high-resolution analog-to-digital conversion improve the tool’s signal-to-noise ratio to increase the sensitivity to fine contrasts in formation resistivity. The result is an increase in image definition by a factor of four.

One-run imaging across widely varying resistivity

Automatic signal processing optimization of the FMI-HD microimager eliminates manual setting of the tool parameters. Wellsite operations are streamlined as the entire dynamic range of formation resistivity is imaged in one run. Even in environments with Rt/Rm ratios as high as 200,000:1, the FMI-HD microimager obtains clear, representative images of the formation geology.

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FMI-HD High-definition formation microimager
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